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Assessing advanced methods in XPS and HAXPES for determining the thicknesses of high-k oxide materials: From ultra-thin layers to deeply buried interfaces

par Bure, T.R.;Renault, Olivier;Nolot, Emmanuel;Robert-Goumet, Christine;Pauly, Nicolas
Référence Applied surface science, 609, 155317
Publication Publié, 2022-10-12

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Titre:	Assessing advanced methods in XPS and HAXPES for determining the thicknesses of high-k oxide materials: From ultra-thin layers to deeply buried interfaces
Auteur:	Bure, T.R.; Renault, Olivier; Nolot, Emmanuel; Robert-Goumet, Christine; Pauly, Nicolas
Informations sur la publication:	Applied surface science, 609, 155317
Statut de publication:	Publié, 2022-10-12
Sujet CREF:	Sciences de l'ingénieur
Mots-clés:	Angle-resolved X-ray photoelectron spectroscopy (ARXPS)
	Atomic layer deposition (ALD)
	Buried layers
	Hard X-ray photoelectron spectroscopy (HAXPES)
	High-k materials
	Inelastic background analysis
Note générale:	SCOPUS: ar.j
Langue:	Français
Identificateurs:	urn:issn:0169-4332
	info:doi/10.1016/j.apsusc.2022.155317
	info:pii/S0169433222028458
	info:scp/85140650970