par Demaude, Annaelle 
;Petitjean, David ;Brabant, Marie ;Gordon, Luke M.J.;Reniers, François
Référence Plasma chemistry and plasma processing, 43, 6, page (1731-1748)
Publication Publié, 2023-11-01
;Petitjean, David ;Brabant, Marie ;Gordon, Luke M.J.;Reniers, François Référence Plasma chemistry and plasma processing, 43, 6, page (1731-1748)
Publication Publié, 2023-11-01
Article révisé par les pairs
| Résumé : | In this work, direct deposition of patterned thin films using immobilized dielectric barrier discharge (DBD) plasma filaments and pulsed sinusoidal excitation in argon/propargyl methacrylate (PMA) mixtures was investigated. Microdischarge ignition and deposition processes were studied in detail and compared with a continuous excitation scheme. In both cases, µm-thick circular areas (‘spots’, S) are deposited from the filaments and a thinner film (‘between the spots’, BS) is generated in between from the non-filament regions. Pulsed excitation was seen to better stabilize filaments than continuous excitation, resulting in milder deposition conditions and lower deposition rates between the spots. X-ray photoelectron spectroscopy (XPS), contact angle, profilometry, and optical microscopy measurements all show that pulsed excitation leads to better patterning (i.e., higher fidelity patterns with greater morphological contrast between S and BS regions), higher retention of PMA chemical functionalities, and less substrate damage. Moreover, by decreasing the deposition time in pulsed mode, area-selective deposition was achieved. |
