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Competitive and synergistic effects between excimer VUV radiation and O radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by an atmospheric He-O2 post-discharge

par Dufour, Thierry ;Hubert, Julie ;Vandencasteele, Nicolas ;Reniers, François ;Viville, Pascal;Lazzaroni, Roberto
Référence Journal of physics. D, Applied physics, 46, 31, 315203
Publication Publié, 2013-08

Article révisé par les pairs

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Résumé :

Among various surface modification techniques, plasma can be used as a source for tailoring the surface properties of diverse materials. HDPE and fluoropolymer surfaces have been treated by the post-discharge of an atmospheric RF-plasma torch supplied with helium and oxygen gases. The plasma-treated surfaces were characterized by measurements of mass losses, water contact angles, x-ray photoelectron spectroscopy and atomic force microscopy. This experimental approach correlated with an optical characterization of the plasma phase allowed us to propose etching mechanisms occurring at the post-discharge/polymer interface. We discuss how competitive and synergistic effects can result from the oxidation and/or the roughening of the surface but also from the excimer VUV radiation, the He metastable species and the O radicals reaching the plasma-polymer interface. © 2013 IOP Publishing Ltd.