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Influence of the anodizing procedure on the structure and the properties of titanium oxide films and its effect on copper nucleation

par Delplancke, Jean-Luc ;Garnier, Amalia;Massiani, Yvan;Winand, René
Référence Electrochimica acta, 39, 8-9, page (1281-1289)
Publication Publié, 1994-06

Article révisé par les pairs

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Résumé :

Thin oxide films are grown electrochemically on commercially pure titanium substrates. Constant potential (potentiostatic), constant current (galvanostatic) and initial constant current followed by constant potential (combined) growth modes are studied. The structure, the composition, the thickness, the electrochemical and the semiconducting properties of the oxide films are considerably influenced by the growth mode even if the final anodizing potential has a constant value. © 1994.