• Citer

Influence of Substrate Bias and Methane Flow on the Properties of Modified Carbon-based Thin Films Deposited by Reactive Magnetron Sputtering for Bio-tribological Applications

par Santos Junior, Emanuel;Martinez Martinez, Diego ;Soares, G.A.;Camargo Junior, Sergio S.;Delplancke, Marie-Paule ;Kubova, Olga
Référence Eleventh international conference on Plasma Surface Engineering (PSE 2008) (September 15-19, 2008: Garmisch-Partenkirchen, Germany)
Publication Non publié, 2008

Poster de conférence

• Détails

Titre:	Influence of Substrate Bias and Methane Flow on the Properties of Modified Carbon-based Thin Films Deposited by Reactive Magnetron Sputtering for Bio-tribological Applications
Auteur:	Santos Junior, Emanuel; Martinez Martinez, Diego; Soares, G.A.; Camargo Junior, Sergio S.; Delplancke, Marie-Paule; Kubova, Olga
Informations sur la publication:	Eleventh international conference on Plasma Surface Engineering (PSE 2008) (September 15-19, 2008: Garmisch-Partenkirchen, Germany)
Statut de publication:	Non publié, 2008
Sujet CREF:	Sciences de l'ingénieur
Langue:	Anglais