par Delplancke, Marie-Paule 
;Asskali, Abderrahman ;Offergeld‐Jardinier, M.;Bouillon, Florent
Référence Journal of Vacuum Science & Technology. A: International Journal Devoted to Vacuum, Surfaces, and Films, 11, 4, page (1510-1515)
Publication Publié, 1993
;Asskali, Abderrahman ;Offergeld‐Jardinier, M.;Bouillon, Florent Référence Journal of Vacuum Science & Technology. A: International Journal Devoted to Vacuum, Surfaces, and Films, 11, 4, page (1510-1515)
Publication Publié, 1993
Article révisé par les pairs
| Résumé : | Thin films of CuRh, CuPd, and AgPd were deposited by glow discharge sputtering onto (100) magnesium oxide single crystals. The rhodium and palladium content ranged from 0% to 100% of precious metal and the film thickness was usually between 10 and 100 nm. The composition, epitaxial relationship, crystallinity, and phase diagram were investigated as a function of substrate temperature and target composition. A comparison of the three systems was realized. Conditions of epitaxy were determined for the pure metals and their alloys. The temperature of epitaxy of the alloys, even at very low precious metal concentrations, is close to that of the group VIII elements. The parallel epitaxial relationship between the deposit and the substrate is identical for the three systems, namely (001)[110]d |
