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Reactivity of a silica network of glass. Molecular mechanism of the dissolution of a silica network in aqueous HF-HCl solutions

par Prokopowicz, Mária
Référence Glastechnische Berichte, 62, 7, page (249-255)
Publication Publié, 1989-07

Article révisé par les pairs

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Résumé :

The molecular model of the dissolution mechanism of a silica network of glass in aqueous HF-HCl solutions is proposed. The kinetic equations for the dissolution rate of a silica network of glass in aqueous HF-HCl solutions derived from the model are described. They assume a first-order dependence on HF2- ions concentration in the solution. The concentration dependence on H+ and HF expressed by Langmuir's isotherms are described. The experimental results confirm the proposed model. It is shown that the increase in the dissolution rate of a silica network of glass in aqueous HF-HCl solutions is due to the increase in electronic density on the glass surface. HF molecules and HF2- ions adsorbed on this surface were responsible for the increase in electronic density.