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Evidence of covalent bond formation at the silane-metal interface during plasma polymerization of bis-1,2-(triethoxysilyl)ethane (BTSE) on aluminium

par Batan, Abdelkrim ;Reniers, François ;Mine, Nicolas;Douhard, Bastien;Pireaux, Jean-Jacques;Brusciotti, Fabiola;De Graeve, Iris;Vereecken, Jean ;Terryn, Herman ;Wenkin, Mireille;Piens, Marcel
Référence Chemical physics letters, 493, 1-3, page (107-112)
Publication Publié, 2010-06

Article révisé par les pairs

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Résumé :

Silane and silane-like films were deposited from bis-1,2-(triethoxysilyl) ethane by vacuum and atmospheric plasma onto aluminium. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) was used for probing the aluminium/plasma polymer film interface. An AlOSi+ fragment was identified at nominal mass m/z = 70.9539 amu, indicating a strong chemical interaction (formation of a covalent bond) at the substrate/film interface. Until now, this strong silane-aluminium interaction has never been observed in plasma polymer BTSE films. Ageing tests in an ultrasonic water bath combined with X-ray photoelectron spectroscopy measurements allowed to indirectly confirm good adhesion, and therefore the formation of a chemical bond at the interface. © 2010 Elsevier B.V. All rights reserved.