par Hu, Qiyang;Ghoniem, Nasr;Walgraef, Daniel 
Référence Physical review. B, Condensed matter and materials physics, 75, 7, 075405
Publication Publié, 2007-02
Référence Physical review. B, Condensed matter and materials physics, 75, 7, 075405
Publication Publié, 2007-02
Article révisé par les pairs
| Résumé : | We investigate here the evolution of self-organized monolayer atomic clusters on atomically flat substrates during epitaxial deposition. A phase field-model is developed for the free energy of the system, which includes short-range as well as long-range interactions between deposited atom clusters mediated by the substrate, using the elastic theory of intrinsic surface stress. Natural self-organization of surface atomic clusters is shown to result from reaction-diffusion kinetics, where patterns are either dots or stripes, at low (high) and intermediate coverage, respectively. Cluster-cluster interactions slightly favor stripes. The length scale of natural self-organized structures is in the tens of nanometers range. Imposition of a substrate periodic strain field by subsurface interfacial dislocations is shown to dramatically change the self-organized pattern and its length scale. Qualitative agreements between model predictions and experimental observations on self-organized Ge quantum dots on Si substrate are demonstrated. © 2007 The American Physical Society. |
