par Remy, Adeline 
;Fall, Serigne M.S.;Segato, Tiriana ;Godet, Stéphane ;Delplancke, Marie-Paule ;Panini, Piyush ;Geerts, Yves ;Reniers, François
Référence Thin solid films, 688, 137437
Publication Publié, 2019-10-01
;Fall, Serigne M.S.;Segato, Tiriana ;Godet, Stéphane ;Delplancke, Marie-Paule ;Panini, Piyush ;Geerts, Yves ;Reniers, François Référence Thin solid films, 688, 137437
Publication Publié, 2019-10-01
Article révisé par les pairs
| Résumé : | The deposition of good quality crystalline inorganic coatings by atmospheric pressure dielectric barrier discharge remains a challenge. Thanks to an original coupling of a substrate heating device based on an inductive current loop and located under the dielectric and an atmospheric pressure dielectric barrier discharge, we show that one can deposit in one step crystalline vanadium oxide and titanium oxide, with grain sizes bigger than those achieved by post-deposition annealing. |
