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Engineering properties of superhard films with ion energy and post-deposition processing

par Monteiro, Othon Rego;Delplancke, Marie-Paule
Référence AIP Conference Proceedings, 680, page (630-634)
Publication Publié, 2003

Article révisé par les pairs

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Résumé :

Recent developments in plasma synthesis of hard materials using energetic ions are described. Metal plasma immersion ion implantation and deposition (MePIIID) was used to prep. several hard films: from diamond-like C (DLC) to carbides, from nitrides to oxides. The energy of the depositing species is controlled to maximize adhesion as well as to change the phys. and chem. properties of the films. Adhesion is promoted by the creation of a graded interface between the film and the substrate. The energy of the depositing ions is also used to modify and control the intrinsic stresses and the microstructure of the films. The deposition is carried out at room temp., which is important for temp. sensitive substrates. A correlation between intrinsic stresses and the energetics of the deposition is presented for the case of DLC films, and means to reduce stress levels are discussed.