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Structure and purity of epitaxial films of copper and rhodium deposited onto MgO single-crystal substrates by glow discharge sputtering

par Delplancke, Marie-Paule ;Delcambe, Pierre ;Binst, Lucien ;Jardinier, Marcelle ;Bouillon, Florent
Référence Thin solid films, 143, 1, page (43-51)
Publication Publié, 1986-09

Article révisé par les pairs

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Résumé :

The structure and surface purity of epitaxial films of rhodium deposited by thermal evaporation and ion sputtering onto MgO(100), air cleaved and chemically polished, and onto epitaxial films of Cu(100) are compared. The orientation (100)d//(100)s (where d indicates deposit and s indicates substrate) is always predominant and only this orientation occurs on the (100)Cu//(100)MgO substrate. Electron diffraction and Auger spectroscopy show that the best results are obtained by glow discharge sputtering onto the last substrate. © 1986.